Abstract
This chapter discusses the ion implantation process of silicon processing
technology in depth. The chapter gives an in-depth insight into various aspects of the
ion implantation process and ion-implanted silicon systems commonly encountered
in a silicon process. After reading this chapter, the readers will have a sound
understanding of the ion implantation process and its various aspects.
Keywords: Buried layer, Channeling, Ion implantation, Ion stopping, Range theory, Recoils.
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