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Current Nanoscience

Editor-in-Chief

ISSN (Print): 1573-4137
ISSN (Online): 1875-6786

Research Article

Development of Micro/Nano Pattern Arrays with Grating-Based Periodic Structures using the Direct Laser Lithography System

Author(s): Rency Rajan, Alfred Kirubaraj*, Senith Samson, Shajin Prince and S.R. Jino Ramson

Volume 21, Issue 1, 2025

Published on: 07 May, 2024

Page: [167 - 177] Pages: 11

DOI: 10.2174/0115734137283785240118095556

Price: $65

Open Access Journals Promotions 2
Abstract

Introduction: This research delves into utilizing the Direct Laser Lithography System to produce micro/nanopattern arrays with grating-based periodic structures. Initially, refining the variation in periodic structures within these arrays becomes a pivotal pursuit. This demands a deep comprehension of how structural variation aligns with specific applications, particularly in photonics and material science.

Methods: Advancements in hardware, software, or process optimization techniques hold potential for reaching this objective. Using an optical beam, this system enables the engraving of moderate periodic and quasi-periodic structures, enhancing pattern formation in a threedimensional environment. Through cost-effective direct-beam interferometry systems utilizing 405 nm GaN and 290 to 780 nm AlInGaN semiconductor laser diodes, patterns ranging from in period were created, employing 300 nm gratings.

Results: The system's cost-efficiency and ability to achieve high-resolution permit the creation of both regular and irregular grating designs. By employing an optical head assembly from a blu-ray disc recorder, housing a semiconductor laser diode and an objective lens with an NA of 0.85, this system displays promising potential in progressing the fabrication of micro/ nanopattern arrays.

Conclusion: Assessing their optical, mechanical, and electrical properties and exploring potential applications across varied fields like optoelectronics, photovoltaics, sensors, and biomedical devices represent critical strides for further exploration and advancement.

Keywords: Laser interference, Direct Laser Lithography System (DLLS), Micro/nano patterns, Depth of Focus (DOF), Depth of Penetration (DOP), optoelectronics.

Graphical Abstract
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