The physics for the ion implantation can be directly implemented in Monte
Carlo (MC) simulation, and hence MC simulation is widely used for predicting ion
implantation profiles. Here, we compared MC simulation results with a vast database of
ion implantation secondary ion mass spectrometry (SIMS), and showed that the Monte
Carlo data sometimes deviated from the experimental data. We modified the electronic
stopping power model, calibrated its parameters, and reproduced most of the database.
We also demonstrated that the Monte Carlo simulation can accurately predict profiles in a
low energy range of around 1 keV once it is calibrated in the higher energy region.
Keywords: Ion implantation, low energy ion implantation, Monte Carlo, nuclear
stopping power, electronic stopping power, channeling, damage, collision
parameter, transferred energy, scattering angle, energy loss, cross section, SIMS,
As, P, B, Ge, HfO2.
