Nanometer-accurate surface coverage has become achievable through
improvements in thin film deposition methods, enabling scientists to construct multilayers
with complex compositions and investigate the cumulative effects of their interactions.
Furthermore, enhancements to the deposition procedure have made it possible to produce
significantly smaller electrical devices, which is crucial for introducing cutting-edge
technology. The development of nanotechnologies, such as thin films, requires stringent
control over the deposition process to minimize the physical dimensions of devices during
manufacturing. Continued research in this area can benefit photovoltaic devices with anticorrosion or biocidal coatings to meet the requirements of contemporary society. This chapter
discusses the relevance of metal oxide thin films and various manufacturing methods. We
also review different characterization techniques, including electron microscopy, x-ray
diffraction, atomic force microscopy, Fourier transform infrared spectroscopy,
photoluminescence, and UV-visible spectroscopy. We emphasize the various applications of
these metal oxide thin films.
Keywords: Applications, Chromic devices, Fourier transform infrared spectroscopy, Gas sensors, Metal oxide, Scanning electron microscopy, Thin film characterization, X-ray diffraction, X-ray photoelectron spectroscopy.
