Silicon Based Thin Film Solar Cells

Sputtering of Thin Films

Author(s): Paolo Rava

Pp: 58-80 (23)

DOI: 10.2174/9781608055180113010007


Sputtering is one of the most widely used techniques for deposition of thin films. This chapter reviews the physical foundations of sputtering in a plasma and its application to the deposition of thin films. Different sputtering techniques are described and their advantages and disadvantages are highlighted.

Keywords: Sputtering, plasma, glow discharge, thin films, magnetron cathode, ion beam, deposition, targets, ionization, gases

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