Recent Progress on Critical Cleaning of Sapphire Single-Crystal Substrates: A Mini-Review

ISSN: 1874-4788 (Online)
ISSN: 2211-3347 (Print)


Volume 7, 2 Issues, 2014


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Editor-in-Chief:
Yousheng Tao
State Key Laboratory of Structural Chemistry
Fujian Institute of Research on the Structure of Matter
Chinese Academy of Sciences
Fuzhou
China


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Recent Progress on Critical Cleaning of Sapphire Single-Crystal Substrates: A Mini-Review

Author(s): Dan Zhang and Yang Gan

Affiliation: School of Chemical Engineering and Technology, Harbin Institute of Technology, Harbin 150001, China.

Abstract

Sapphire single-crystals are one of the industrial favorite substrates for GaN film deposition and LED application as well as a model system for oxides’ aqueous interfacial chemistry studies. Contamination control of sapphire substrates is critical to the device fabrication and experimental studies of interfacial properties. Here we reviewed various methods reported in the literature including conventional and new wet-chemical methods, and UV/plasma methods. Special attentions were paid to their cleaning performance in terms of reliably removing organic/particulate/heavy metallic contaminants.

Keywords: Contamination control, Sapphire, Surface chemistry, Surface structure, UV/plasma cleaning methods, Wetchemical cleaning methods.

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Article Details

Volume: 6
Issue Number: 3
First Page: 161
Last Page: 166
Page Count: 6
DOI: 10.2174/2211334707999140331121752
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