Recent Progress on Critical Cleaning of Sapphire Single-Crystal Substrates: A Mini-Review



Volume , Issues,






Aims & ScopeAbstracted/Indexed in




View Full Editorial Board




Recent Progress on Critical Cleaning of Sapphire Single-Crystal Substrates: A Mini-Review

Author(s): Dan Zhang and Yang Gan

Affiliation: School of Chemical Engineering and Technology, Harbin Institute of Technology, Harbin 150001, China.

Abstract

Sapphire single-crystals are one of the industrial favorite substrates for GaN film deposition and LED application as well as a model system for oxides’ aqueous interfacial chemistry studies. Contamination control of sapphire substrates is critical to the device fabrication and experimental studies of interfacial properties. Here we reviewed various methods reported in the literature including conventional and new wet-chemical methods, and UV/plasma methods. Special attentions were paid to their cleaning performance in terms of reliably removing organic/particulate/heavy metallic contaminants.

Keywords: Contamination control, Sapphire, Surface chemistry, Surface structure, UV/plasma cleaning methods, Wetchemical cleaning methods.

Purchase Online Order Reprints Order Eprints Rights and Permissions

  
  



Article Details

Volume: 6
Issue Number: 3
First Page: 161
Last Page: 166
Page Count: 6
DOI: 10.2174/2211334707999140331121752
Advertisement


Webmaster Contact: urooj@benthamscience.org Copyright © 2015 Bentham Science